Effects of the Deposition Mode and Heat Treatment on the Microstructure and Wettability of Y2O3 Coatings Prepared by Reactive Magnetron Sputtering

A robust hydrophobic Y2O3 coating at high temperatures is important for industrial applications. In this study, thin films on Si substrates were prepared by reactive direct current magnetron sputtering. By changing the deposition power, with different microstructures obtained in poison mode and metallic mode, respectively. order to understand effect of heat treatment microstructure hydrophobicity Y2O3, samples annealed 400 °C air. Compared no crack was formed surface film mode. addition, water contact angle deposited above 90° before after annealing °C. It has been demonstrated that initial concentration physically absorbed oxygen its slow desorption process a contributes temperatures. These results can provide insights into large-scale fabrication coatings high-temperature